Products

RF PLASMA SOURCES

Exceptional utility for various applications

RF PLASMA SOURCES are used in many applications to produce low energy beams of atomic nitrogen, oxygen, and hydrogen. VESCO-NM RF plasma sources can also be used for doping and semiconductor processing applications. Our RF plasma sources demonstrate high dissociation efficiencies enabling growth of high quality MBE nitrides and oxides for electronic and optoelectronic applications.

Specifications:

1. Plasma sources for Nitrogen, Hydrogen, and Oxygen
2. Plasma strikes at low power
3. Very stable plasma modes
4. Long-time continuous operation
5. Compatible with different MBE and processing machines
6. No brazing between gas tube injection and plasma chamber
7. Easy to operate and to install
8. Replaceable PBN plasma chamber and insert
9. Interchangeable aperture disks for different applications
10. Mounting flange: 4.5” (As Required)
11. In-Vacuum length: 12.5” (As Required)
12. Outside length: 8.625”
13. In-vacuum tube diameter: 2.125”
14. RF coil and cooling length: 5”
15. Plasma insert and plasma chamber: PBN

Nitrogen Plasma Results & Data:

100 W

150 W

200 W

Plasma Striking At 275 W & Remains Stable At 15 W

Hydrogen Plasma Results & Data:

50 W

200 W

250 W

VESCO-NM Provides Complete Plasma Systems

• Plasma sources
• Matching unit
• RF Power Unit
• Gas flow leak valve and/or controller
• Water filter and flow meter
• High purity gas cabinet and valve controller
• Free installation and operation