Delivering MBE & MOCVD Solutions For Over 25 Years.

New & Pre-Owned Systems
Proprietary Systems & Components 
Custom Specifications

Who We Are

VESCO-NM manufactures state of the art proprietary MBE systems and components as well as components for MOCVD systems. We specialize in MBE, MOCVD and semiconductor cleanroom tools decommissioning, decontamination and installations.

Products & Services

MBE Systems

The VESCO Ultima 310TM is a versatile state of the art MBE system, suitable as a research and/or production tool for III-V, II-VI and many other materials

Valved Crackers

Our Valved Crackers are designed to be precisely controlled with high flux uniformity, excellent flux stability and dynamic flux range.

Effusion Cells

Our cells are uniquely designed and manufactured with a strong focus on reliability and longevity. They are produced in different sizes and are suitable for a variety of temperatures.

RF Plasma Sources

Our sources demonstrate high dissociation efficiencies, enabling growth of high quality MBE nitrides & oxides for electronic & optoelectronic applications.

MBE Heaters

Our heaters are developed from 0.040″ OD tantalum wire; specifically designed to maximize their lifetime operation under harsh low vacuum environments (1E-2 Torr).

Refurbishments

We will professionally refurbish and restore your system (MBE & MOCVD) as well as components including all effusion cells, crackers, gas injectors and more.

Decommissioning & De-Installation

We have decommissioned and de-installed various semiconductor tools and equipment for over two decades all over the globe.”

Decontamination

Comprehensive decontamination and cleaning services for semiconductor and cleanroom tools & equipment.

Global Footprint

300+

Customers Served Worldwide

40+

Years of Experience

Who We Have Served

Popular Products

Valved Crackers

Used in MBE growth, to crack reactive materials with high vapor pressure such as Sb, Zn, Se, Cd, CdTe, Te, and Mg.

High Temperature Effusion Cells

Specifically designed for evaporation or sublimation of low vapor pressure materials in the temperature range of 1500°C-2000°C.

RF Plasma Sources

Our plasma sources show high dissociation efficiencies that enable growth of high quality MBE nitrides and oxides for electronic and optoelectronic applications

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