VESCO-300™ MBE SYSTEM
Exceptionally versatile with high functionality suitable as a research and/or
production tool
The VESCO-300™ is a state-of-the-art MBE system for various materials and many applications. The system enables growth for many applications with manual and automatic wafer transfer options.
Specifications
- Wafer 1-3 inches,
- 12 sources
- 300 CC Antimony valved cracker
- 500 CC Arsenic valved cracker
- RF plasma source for (H2, N2, O2)
- Substrate heater up to 1200°C
- All characterization tools (RHEED, QMS, flux monitor)
- High capabilities for growing different materials in one chamber
- View ports with integrated heaters, LED, and Cameras
- Easy to move, operate, and install
- Small footprint, space, minimum power and utilities consumption
- Very reliable and efficient
- Easy wafer loading/unloading and transfer
- Automatic or manual operation
- Separate and movable flux monitor
- No additional cabinets (all machine on cart)
- Wiring and cables are hidden in conduit
- Competitive price
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