Exceptional utility for various applications
RF PLASMA SOURCES are used in many applications to produce low energy beams of atomic nitrogen, oxygen, and hydrogen. VESCO-NM RF plasma sources can also be used for doping and semiconductor processing and wafer cleaning applications. Our RF plasma sources demonstrate high dissociation efficiencies enabling growth of high quality MBE nitrides and oxides for electronic and optoelectronic applications. We manufacture RF plasma sources for all gases; Nitrogen, Oxygen, and Hydrogen, as well as deflection plates RF plasma sources. We also make reliable and stable RF matching unit.