MBE system for up to 3 inche samples with 10 ports for a combination of 10 sources and effusion cells. This system is exceptionally versatile with high functionality suitable as a research and production tool for III/V, II/VI, and other materials. The VESCO-ULTIMA 310 is the state-of-the-art MBE system which enables growth for many applications with fully automated wafer transfer options.
Separate and movable flux monitor
Competitive price
Efficient UHV pumping stations with base pressure less than 5 E 10-11 mbar
LN2 cooling shroud
| Growth Chamber Size | 22” OD, 24” height |
|---|---|
| Buffer Chamber Size | 28” OD, 10” height |
| Load Lock Chamber Size | 6-way 8” cross |
| Wafer Cassette Size | Two cassettes, 8 sample holder each |
| Buffer Chamber Capacity | 8 sample holders 36 degrees apart |
| Substrate Size | up to 3 inch |
| System Pumping Stations |
Growth chamber: Cryo, ion, and TS pumps Buffer chamber: Ion and TS pumps Load lock: turbo and scroll pumps |
| Cooling Shroud | LN2 or other cooling liquid |
| Substrate Heater Temperature | Up to 1200 °C |
| Bakeout Temperature | Up to 200 °C |
| Sources Port Sizes | 4.5” CF flange |
| Types of Sources | Effusion cells, valved crackers, RF plasma sources, e-beam sources, sublimation sources, and gas injector sources |
| Shutters | Magnetically coupled liner shutters |
| In-situ Monitoring | Ion gauge, QCM, pyrometer, RHEED, QMA |
| Sample Transfer | Robot transfer arm with azimuth and z travels |
| Service | System installation and acceptance testing |
| Training | By MBE experts |