Three Inch wafer, 8 sources.
Indium-free 10 sample holders with different profiles.
Substrate heater up to 1000 C.
Substrate manipulator: power supply, temperature controller, and servo motor control unit.
Clean chamber and can be used for any materials.
All sources are on 4.5” flanges.
Effusion cells can be configured as required.
Two valved crackers (as required).
RF plasma source for either nitrogen or oxygen.
Growth chamber pumps: 400 l/m ion pump and 10” cryo pump.
Prep chamber pumps: 220 l/m ion pump.
Load lock pumps: Sorption, mechanical, and turbo pumps.
Three ion gauges and controllers.
RHEED and QMS systems.
Pyrometer.
New software and PC.
Bake out panels.
