| Growth Chamber Size | 22” OD, 24” height |
|---|---|
| Buffer Chamber Size | 28” OD, 10” height |
| Load Lock Chamber Size | 6-way 8” cross |
| Wafer Cassette Size | Two cassettes, 8 sample holder each |
| Buffer Chamber Capacity | 8 sample holders 36 degrees apart |
| Substrate Size | up to 3 inch |
| System Pumping Stations |
Growth chamber: Cryo, ion, and TS pumps Buffer chamber: Ion and TS pumps Load lock: turbo and scroll pumps |
| Cooling Shroud | LN2 or other cooling liquid |
| Substrate Heater Temperature | Up to 1200 °C |
| Bakeout Temperature | Up to 200 °C |
| Sources Port Sizes | 4.5” CF flange |
| Types of Sources | Effusion cells, valved crackers, RF plasma sources, e-beam sources, sublimation sources, and gas injector sources |
| Shutters | Magnetically coupled liner shutters |
| In-situ Monitoring | Ion gauge, QCM, pyrometer, RHEED, QMA |
| Sample Transfer | Robot transfer arm with azimuth and z travels |
| Service | System installation and acceptance testing |
| Training | By MBE experts |